Ion-exchange Agarose Resin

Based on agarose microspheres, GLKgel IEX resin provide SP, Q, ANX, DEDA, MMC, MMA series of ion-exchange chromatography media to need different purification processes.

GLKgel Strong Cation IEX SP Resin

 SP 6BBSP 6FFSP 6HFSP 6HPSP 6XLSP HPR
Substrate6% cross-linked AgaroseHigh-rigid Agarose6% cross-linked Agarose6% cross-linked Agarose with glucanHigh-rigid Agarose
Particle Size200μm

(165-300μm)

90μm

(45-165μm)

90μm

(45-165μm)

37μm

(25-45μm)

90μm

(45-165μm)

37μm

(25-45μm)

Ligand-CH2CH2CH2SO3-
Loading

Capacity

180-250μmol

H+/ml resin

140-200μmol H+/ml resin150-200μmol H+/ml resin180-250μmol H+/ml resin130-160μmol H+/ml resin
pH Stability4-13 (Long)

3-14 (Short)

4-12 (Long)

3-14 (Short)

4-13 (Long)

3-14 (Short)

4-12 (Long)

3-14 (Short)

Pressure≤0.3MPa≤0.5MPa
Flow Rate1800cm/h700 cm/h100 cm/h150 cm/h700 cm/h400 cm/h
Chemical StabilityAll common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage0.2M NaAc, 20% EtOH, 4-30℃

GLKgel Strong Anion IEX Q Resin

 Q 6BBQ 6FFQ 6HFQ 6HPQ 6XLQ HPR
Substrate6% cross-linked AgaroseHigh-rigid Agarose6% cross-linked Agarose6% cross-linked Agarose with glucanHigh-rigid Agarose
Particle Size200μm

(165-300μm)

90μm

(45-165μm)

90μm

(45-165μm)

37μm

(25-45μm)

90μm

(45-165μm)

37μm

(25-45μm)

Ligand-N+(CH3)3
Loading Capacity180-250μmol

Cl-/ml resin

160-200μmol

Cl-/ml resin

140-200μmol

Cl-/ml resin

180-250μmol Cl-/ml resin150-180μmol Cl-/ml resin
pH Stability2-12 (Long Period)

2-14 (Short Period)

2-12 (Long)

2-14 (Short )

2-12 (Long)

2-14 (Short)

2-12 (Long )

2-14 (Short)

Pressure≤0.3MPa≤0.5MPa
Flow Rate1800cm/h700 cm/h1000 cm/h150 cm/h700 cm/h400 cm/h
Chemical StabilityAll common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage20% EtOH, 4-30℃

GLKgel Strong Anion IEX MMA Resin

 SubstrateParticle SizeLigandCapacitypH StabilitypH StabilityFlow Rate
MMA 6HFHigh Rigid

Agarose

90μm

(45-165μm)

90-120μmol

Cl-/ml resin

2-14 (Long)

4-12 (Short)

≤0.5 MPa1000 cm/h
MMA HPRHigh Rigid

Agarose

37μm

(25-45μm)

80-110μmol

Cl-/ml resin

2-14 (Long)

4-12 (Short)

≤0.5 MPa400 cm/h
Chemical StabilityAll common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage  20% EtOH, 4-30℃

GLKgel Weak Cation IEX CM Resin

 CM 6FFCM 6HFCM 6HPCM 6XL
Substrate6% cross-linked

Agarose

High-rigid

Agarose

6% cross-linked

Agarose

6% cross-linked Agarose with glucan
Particle Size90μm (45-165μm)90μm (45-165μm)37μm (25-45μm)90μm (45-165μm)
Ligand-O-CH2COO-
Capacity90-130μmol

H+/ml resin

90-120μmol

H+/ml resin

80-110μmol

H+/ml resin

180-250μmol

H+/ml resin

pH Stability4-13 (Long)

2-14 (Short)

4-12 (Long)

3-14 (Short)

4-13 (Long)

2-14 (Short)

Pressure≤0.3 MPa≤0.5MPa≤0.3 MPa
Flow Rate700 cm/h1000 cm/h150 cm/h700 cm/h
Chemical

Stability

All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage 20% EtOH, 4-30℃

GLKgel Weak Cation IEX MMC Resin

 SubstrateParticle SizeLigandCapacitypH StabilitypH StabilityFlow Rate
MMC 6HFHigh Rigid

Agarose

90μm

(45-165μm)

70-90μmol

H+/ml resin

2-14 (Long)

3-12 (Short)

≤0.5 MPa1000 cm/h
MMC HPRHigh Rigid

Agarose

37μm

(25-45μm)

60-80μmol

H+/ml resin

2-14 (Long)

3-12 (Short)

≤0.5 MPa400 cm/h
Chemical StabilityAll common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage  20% EtOH, 4-30℃

GLKgel Weak Anion IEX DEDA Resin

 DEDA 6FFDEDA 6HFDEDA 6HPDEDA 6XL
Substrate6% cross-linked AgaroseHigh-rigid Agarose6% cross-linked Agarose6% cross-linked Agarose
Particle Size90μm (45-165μm)90μm (45-165μm)37μm (25-45μm)90μm (45-165μm)
Ligand-N+(CH3)3
Capacity110-160μmol

Cl-/ml resin

290-350μmol

Cl-/ml resin

90-130μmol

Cl-/ml resin

110-160μmol

Cl-/ml resin

pH Stability2-13 (Long)

1-14 (Short)

2-12 (Long)

2-14 (Short)

2-13 (Long)

1-14 (Short)

Pressure≤0.3 MPa≤0.5MPa≤0.3 MPa
Flow Rate700 cm/h1000 cm/h150 cm/h700 cm/h
Chemical Stability All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage  20% EtOH, 4-30℃

GLKgel Weak Anion IEX ANX Resin

 SubstrateParticle SizeLigandCapacitypH StabilitypH StabilityFlow Rate
ANX 4FF4% cross-linked Agarose90μm (45-165μm)-N+(C2H5)2H130-170μmol

Cl-/ml resin

3-10 (Long)

2-14 (Short)

≤0.3 MPa250 cm/h
Chemical StabilityAll common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol

Avoid using oxidant, cationic detergent, cationic buffer

Storage  20% EtOH, 4-30℃

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