VirCap® Oligo dT(25) Affinity Resin

For mRNA Purification

VirCap® Oligo dT(25) Affinity Resin is based on rigid, 50μm polymeric resin designed to isolate messenger RNA (mRNA). The resin backbone consists of crosslinked poly(styrene-divinylbenzene).
The polyhydroxy surface coating provides low non-specific binding. The surface is functionalized with poly(dT) and allows capture of mRNA through base pairing with the mRNA polyA tail.
VirCap® Oligo dT(25) Affinity Resin provides efficient capture and release under standard mRNA purification conditions. It thereby decreases process development time and enhances productivity. In addition, the selective nature of this resin allows a reduction in plasmid DNA and other transcription mix components. The resin is also stable at elevated temperatures for the breakdown of undesired higher-order structures if required.

chemical structure

Features

  • Easy mRNA purification from crude transcription mix to effectively remove plasmid DNA and other IVT components
  • Simplified workflow helps to maximize efficiency, thereby reducing the complexity of subsequent polish steps
  • Excellent scalability
  • Non-animal derived

VirCap® Oligo ligands are manufactured using a synthetic manufacturing process that is free of animal components.

Specification

Support matrixCross-linked poly (styrene-divinylbenzene)
Surface functionalitydT-25mer
Ligand density0.2 umol dT/mL resin
Shipping solvent20% ethanol
Average particle size50 µm
Average pore diameter200 nm
Mechanical resistance1000 psi (6.9 MPa)
Suggested compression factor1.06
Operating temperature2 to 65˚C Do not freeze

 

Chemical & Thermal Resistance

pH Range2–13
Ionic strength range0 to 5 M, all common salts
Buffer additivesCommon agents for mRNA purification, including 0.5 M NaOH, 2 MMgCl2, 20 mM EDTA.
Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, THF, or benzyl alcohol.
SolventsWater, 0 to 100% alcohol, acetonitrile, 2 M acetic acid, 1 M HCl, other common organic solvents.
Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, benzyl alcohol, or THF.
Flow rateAdjust flow rate depending on performance. Do not exceed upper-pressure limitations.

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