VirCap® Oligo dT(25) Affinity Resin

For mRNA Purification

VirCap® Oligo dT(25) Affinity Resin is designed for the purification and isolation of mRNA from in vitro transcription (IVT) manufacturing processes. The resin effectively separates mRNA from components of the transcription reaction process, such as enzymes and plasmid DNA.

VirCap® Oligo dT(25) Affinity Resin is designed to meet the selectivity and capacity requirements for large-scale downstream purification of a variety of mRNA constructs used in vaccine and gene therapy applications. Unlike alternative approaches, the resin selectively captures mRNA via the polyadenylated (polyA) tail using simple salt and water purification steps.

GALAK Oligo dT(25)

Features

  • Easy mRNA purification from crude transcription mix to effectively remove plasmid DNA and other IVT components
  • Simplified workflow helps to maximize efficiency, thereby reducing the complexity of subsequent polish steps
  • Excellent scalability
  • Non-animal derived

VirCap® Oligo ligands are manufactured using a synthetic manufacturing process that is free of animal components.

Specification

Characteristic Description
Support Matrix Cross-linked poly(styrene-divinylbenzene)
Average Particle Size 50 um
Average Pore Size 200 nm
Surface Functionality poly(dT) 25mer with proprietary linker
Ligand Density 0.3 umol/ml
Mechanical Resistance 70 bar (1,000 psi; 7 MPa)
Thermal Stability allows sample denaturing at 65°C if needed
pH Range 2-13
Ionic Strength Range 0 to 5 M, all common salts
Chemical Resistance Common agents for mRNA purification, include 0.5 M NaOH, 2 M MgCl2, 20 mM EDTA. Water, 0 to 100% alcohol, acetonitrile, 2 M acetic acid, 1 M HCl, and other common organic solvents
Storage 18-20% ethanol

Chemical & Thermal Resistance

pH Range 2–13
Ionic Strength Range 0 to 5 M, all common salts
Buffer Additives Common agents for mRNA purification, include 0.5 M NaOH, 2 MMgCl2, 20 mM EDTA.

Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, THF, or benzyl alcohol.

Solvents Water, 0 to 100% alcohol, acetonitrile, 2 M acetic acid, 1 M HCl, and other common organic solvents.

Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, benzyl alcohol, or THF.

Flow rate Adjust flow rate depending on performance. Do not exceed upper-pressure limitations.

Product Comparison

GALAK Oligo dT(25)
GALAK Oligo dT(25)
GALAK Oligo dT(25)

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